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2026 Council of Members Meeting

30 June 2026

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mmWave Permittivity Reference Material Development



2024 Project Leadership Award

Congratulations to the mmWave Permittivity Reference Material Development Project team for receiving a 2024 INEMI Project Leadership Award. These awards recognize project teams that have demonstrated superior performance of electronics manufacturing practices, provided solutions that enable significant technology and business results and/or had a positive impact on the electronics manufacturing value chain and its ecosystem. The project team members are:

Project Leads 

  •  Michael J Hill (Intel)
  • Nate Orloff (NIST)
  • Lucas Enright (NIST)
  • INEMI Project Manager: Urmi Ray 

Primary Project Team

  •  Benjamin Jamroz, NIST
  • Say Phommakesone & Daisuke Kato, Keysight
  • Marzena Olszewska-Placha & Malgorzata Celuch, QWED
  • Shelby Nelson, Mosaic Microsystems
  • Hanna Kahari, Nokia
  • Charlie Hill, 3M
  • Chiawen Lee & Chang-Sheng Chen, ITRI
  • Ushio Sangawa, Panasonic
  • Nakamura Yukio Xills & Ikeda Kenichi, Resonac

End-of-Project Webinar

End-of-Project Webinar: mmWave Permittivity Reference Material Development (January 17, 2024) 
 

Statement of Work & Project Statement

Statement of Work (SOW) v1.0 (May 5, 2022)
Project Statement (PS) v1.0 (May 5, 2022)
 

Project Focus

Next-generation 5G/6G solutions require ultra-low loss laminate materials and PCBs/substrates for the efficient design of communications equipment. Development of standard reference materials for precision permittivity characterization metrologies could enable industry to speed development time by reducing the need for iterative design tuning caused by errors in material models.

INEMI's 5G/mmWave Materials Assessment and Characterization project identified an urgent industry need for reference materials that can be used reliably for low loss material measurements using commercially available tools. The goal of the mmWave Permittivity Reference Material Development project is to develop and characterize suitable reference material(s) for consistent Df/Dk measurement methodologies for characterizing ultra low loss laminate materials. The project team plans to develop a requirements document describing the physical and electrical requirements needed to make a traceable permittivity reference sample useful to industry for calibrating high frequency dielectric characterization spanning 10 GHz to 100 GHz. They will:

  • Determine specific physical and electrical characteristics that are necessary for a permittivity reference sample to be useful for industry
  • Examine practical issues that may limit usability of a reference artifact such as physical handling challenges, compatibility with common measurement equipment sets, and artifact surface and uniformity limitations
  • Study trade-offs between usability and accuracy
  • Summarize recommendations to enable standards organizations to develop industry-useful, fully traceable reference artifacts for permittivity equipment calibrations spanning to 100 GHz
  • Evaluate proof-of-concept artifacts developed by standards organizations for usability by multiple laboratories using a variety of tool sets

 

Presentations

Call-for-Participation - Webinar Presentation (May 5, 2022)

“Standardize Material Characterization to Enhance Future Communication and Sensing Application,” Chang-Sheng Chen, PhD, Industrial Technology Research Institute (ITRI), INEMI Session at IMPACT 2023, October 25, 2023; Taipei, Taiwan (available to members only)

Microwave Materials Keynote: “Recent Developments and Cross-Calibration of Resonator-Based Techniques for Microwave and mmWave Materials Assessment," Malgorzata Celuch and Marzena Olszewska-Placha (QWED), presented by Malgorzata Celuch, Microwave Materials and their Applications (MMA) conference, September 27, 2023; Mainz, Germany.

 

Contact

Urmi Ray
[email protected]

Project Leaders

Michael J Hill, Intel

Nate Orloff, NIST

 

 

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